ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,303, issued on Nov. 3, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Substrate inspection apparatus and a method of inspecting a substrate using the same" was invented by Kwang-Eun Kim (Suwon-si, South Korea), Sewon Kim (Suwon-si, South Korea), Seo Young Park (Suwon-si, South Korea), Jeongho Ahn (Suwon-si, South Korea) and Sungeun Lee (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of inspecting a substrate includes providing a substrate on a test stage, the substrate including a plurality of regions, and scanning the substrate using a scanning electron microscope (SEM) column, where the scannin...