US Patent Issued to SAMSUNG ELECTRONICS on Nov. 3 for "Scanning electron microscope image distortion correction method, and semiconductor manufacturing method using the correction method" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,784,160, issued on Nov. 3, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Scanning electron microscope image distortion correction method, and semiconductor manufacturing method using the correction method" was invented by Minsu Kang (Suwon-si, South Korea), Kwangeun Kim (Suwon-si, South Korea), Janghoon Kim (Suwon-si, South Korea), Seoyoung Park (Suwon-si, South Korea), Sangho Yun (Suwon-si, South Korea), Sungeun Lee (Suwon-si, South Korea) and Woojin Jung (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An scanning electron microscope (SEM) image distortion correction method includes obtaining at least one S...