US Patent Issued to SAMSUNG ELECTRONICS on May 26 for "Gas treatment system, semiconductor process system including the same, and gas treatment method using the same" (South Korean Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,636,612, issued on May 26, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Gas treatment system, semiconductor process system including the same, and gas treatment method using the same" was invented by Wonsu Lee (Suwon-si, South Korea), Hyunseok Kim (Suwon-si, South Korea), Jungdae Park (Suwon-si, South Korea), Kimoon Lee (Suwon-si, South Korea) and Jong-San Chang (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gas treatment system includes a first scrubber configured to treat a gas exhausted from a process chamber, a catalytic reactor connected to the first scrubber and configured to treat a gas passing th...