ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,361, issued on May 12, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).
"Dielectric having high-dielectric constant, method of manufacturing the same, target material for manufacturing the dielectric, electronic device including the dielectric, and electronic apparatus including the electronic device" was invented by Hyungjun Kim (Suwon-si, South Korea), Yong-Hee Cho (Suwon-si, South Korea), Yongsung Kim (Suwon-si, South Korea), Boeun Park (Hwaseong-si, South Korea), Jeongil Bang (Suwon-si, South Korea) and Jooho Lee (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a high-dielectric and me...