US Patent Issued to SAMSUNG ELECTRONICS on March 31 for "Method verifying process proximity correction using machine learning, and semiconductor manufacturing method using same" (South Korean Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,728, issued on March 31, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Method verifying process proximity correction using machine learning, and semiconductor manufacturing method using same" was invented by Seorim Moon (Seoul, South Korea), Bonhyun Gu (Suwon-si, South Korea) and Sooyong Lee (Yongin-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a semiconductor chip includes; generating a layout pattern, performing Process Proximity Correction (PPC) on the layout pattern to generate a PPC layout pattern, wherein the performing of PPC includes verifying the PPC layout pattern using m...