US Patent Issued to Samsung Electronics on March 24 for "Method and device for pattern design for sidelink positioning reference signals" (California, Illinois Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,587,998, issued on March 24, was assigned to Samsung Electronics Co. Ltd (South Korea).

"Method and device for pattern design for sidelink positioning reference signals" was invented by Yuhan Zhou (San Diego), Philippe Jean Marc Michel Sartori (Naperville, Ill.) and Yaser Mohamed Mostafa Kamal Fouad (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and a device are provided in which a user equipment (UE) allocates, in a dedicated resource pool for transmitting a sidelink (SL)-positioning reference signal (PRS), a first resource in a slot for SL-PRS symbols, allocates, in the dedicated resource pool, a second resource in a control regio...