ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,672, issued on March 17, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Reaction gas supply system" was invented by Jungjoon Pyeon (Hwaseong-si, South Korea), Seoyoung Maeng (Seoul, South Korea), Iljun Jeon (Hwaseong-si, South Korea), Suji Gim (Hwaseong-si, South Korea), Youngseok Roh (Hwaseong-si, South Korea) and Jongyong Bae (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A reaction gas supply system includes a reaction chamber configured to process a substrate using a reaction gas, a mass flow controller (MFC) configured to control an amount of the reaction gas supplied to the reaction chamber, a...