ALEXANDRIA, Va., March 17 -- United States Patent no. 12,580,158, issued on March 17, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Plasma processing apparatus, substrate bonding system including the same, and substrate bonding method using the same" was invented by Inhwa Baek (Hwaseong-si, South Korea), Donggap Shin (Seoul, South Korea), Yongin Lee (Seoul, South Korea), Se-Hoon Jang (Hwaseong-si, South Korea), Youngho Kim (Gwangju-si, South Korea), Ho Kim (Hwaseong-si, South Korea), Seungdae Seok (Seongnam-si, South Korea) and Siwoong Woo (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Plasma processing apparatuses, substrate bonding systems, and substrate b...