ALEXANDRIA, Va., March 17 -- United States Patent no. 12,582,011, issued on March 17, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).

"Device including first structure having peripheral circuit and second structure having gate layers" was invented by Eunji Kim (Seoul, South Korea), Seungwoo Paek (Yongin-si, South Korea), Byungkyu Kim (Seoul, South Korea), Sangjun Park (Yongin-si, South Korea) and Sungdong Cho (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A device including a first structure and a second structure is provided. The device includes a substrate, a peripheral circuit and first junction pads on the substrate; a first insulating structure surround...