US Patent Issued to SAMSUNG ELECTRONICS on June 2 for "Method of fabricating semiconductor device using apparatus for supplying supercritical fluids" (South Korean Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,644,188, issued on June 2, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Method of fabricating semiconductor device using apparatus for supplying supercritical fluids" was invented by Yong-Jhin Cho (Hwaseong-si, South Korea) and Young Tae Kim (Incheon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for fabricating a semiconductor device includes a chamber accommodating a substrate coated with a first fluid, a lower inlet which is placed in a lower wall of the chamber and providing a first supercritical fluid into the chamber, an upper inlet placed in an upper wall of the chamber and providing a second sup...