ALEXANDRIA, Va., July 7 -- United States Patent no. 12,676,288, issued on July 7, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Substrate analysis system" was invented by Jonghyeok Park (Suwon-si, South Korea), Kwangrak Kim (Suwon-si, South Korea), Jiwoong Kim (Suwon-si, South Korea), Hyenok Park (Suwon-si, South Korea), Jeonghyeon Wang (Suwon-si, South Korea), Myungjun Lee (Suwon-si, South Korea), Yunje Cho (Suwon-si, South Korea), Junghee Cho (Suwon-si, South Korea) and Yun Hwang (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate analysis system includes a load-lock module configured to load or unload a substrate on which a pattern layer is formed; a ...