US Patent Issued to SAMSUNG ELECTRONICS on July 28 for "Method for fabricating photomask layout and method for fabricating of semiconductor device using the same" (South Korean Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,694,194, issued on July 28, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-Si, South Korea).

"Method for fabricating photomask layout and method for fabricating of semiconductor device using the same" was invented by Sung-Yong Moon (Seoul, South Korea) and Won-Chan Lee (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for fabricating a photomask layout is provided. The method includes: receiving a first layout including a main pattern; generating a second layout by generating an assist feature in consideration of optical properties of the main pattern in the first layout; generating a third layout by performing optic...