ALEXANDRIA, Va., July 21 -- United States Patent no. 12,686,036, issued on July 21, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Cleaning apparatus and substrate processing apparatus" was invented by Sangjine Park (Suwon-si, South Korea) and Ji Hwan Park (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a cleaning apparatus that includes a nozzle configured to spray cleaning liquid, a nozzle extension comprising a nozzle extension body having a first aperture and a second aperture connected by a fluid passage in the nozzle extension body, the first aperture aligned with the nozzle and the second aperture for discharging the cleaning liquid, and the fi...