US Patent Issued to SAMSUNG ELECTRONICS on July 14 for "Photoresist compositions for EUV and methods for manufacturing semiconductor devices using the same" (South Korean Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,387, issued on July 14, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Photoresist compositions for EUV and methods for manufacturing semiconductor devices using the same" was invented by Juhyeon Park (Hwaseong-si, South Korea), Ji Yup Kim (Suwon-si, South Korea), Jinjoo Kim (Seoul, South Korea), Hyunwoo Kim (Seongnam-si, South Korea) and Sung Hwan Park (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are photoresist compositions for EUV and methods for manufacturing a semiconductor device using the same. The photoresist compositions for EUV include a photosensitive resin, a photoacid generator, ...