ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,758, issued on Jan. 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Substrate inspection system and method of manufacturing semiconductor device using substrate inspection system" was invented by Eunhee Jeang (Paju-si, South Korea), Boris Afinogenov (Suwon-si, South Korea), Sangwoo Bae (Seoul, South Korea), Wondon Joo (Seoul, South Korea), Maksim Riabko (Suwon-si, South Korea), Anton Medvedev (Suwon-si, South Korea), Aleksandr Shorokhov (Suwon-si, South Korea), Anton Sofronov (Suwon-si, South Korea), Ingi Kim (Seoul, South Korea), Taehyun Kim (Suwon-si, South Korea), Minhwan Seo (Hwaseong-si, South Korea), Sangmin Lee (Yongin-si, South Korea) and Seulgi ...