ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,699, issued on Jan. 20, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Photoresist coating apparatus" was invented by Heeyun Choi (Suwon-si, South Korea), Kyoungwhan Oh (Suwon-si, South Korea), Hokyun Kim (Suwon-si, South Korea), Junhee Lee (Suwon-si, South Korea) and Yohan Choe (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A photoresist coating apparatus includes a photoresist trap tank temporarily storing a photoresist. A photoresist supply pipe is connected to the photoresist trap tank. A pump is connected to the photoresist supply pipe. A photoresist pressing device is connected to the photoresist ...