ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,529, issued on Feb. 24, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).

"Imaging ellipsometer and method of measuring an overlay error using the same" was invented by Jaehyeon Son (Suwon-si, South Korea), Jinwoo Ahn (Suwon-si, South Korea), Juntaek Oh (Suwon-si, South Korea), Hankyoul Moon (Suwon-si, South Korea), Myungjun Lee (Suwon-si, South Korea) and Eunsoo Hwang (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a method of measuring an alignment error, light is incident on a surface of a reference wafer having a known polarization transmittance at the surface. An image signal is obtained from the ref...