ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,553,834, issued on Feb. 17, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Substrate inspection method" was invented by Kihong Chung (Suwon-si, South Korea), Kiwook Song (Suwon-si, South Korea), Seungryeol Oh (Suwon-si, South Korea) and Chungsam Jun (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate inspection method includes radiating light onto a substrate, extracting a spectrum representing an intensity of light according to a wavelength from a light reflected from the substrate, analyzing the extracted spectrum in units of each of an entire substrate, a shot, a chip, and a block, generating a sp...