ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,555,744, issued on Feb. 17, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Plasma process apparatus" was invented by Jaesuk Kim (Suwon-si, South Korea), Sangwook Park (Suwon-si, South Korea), Gukrok Yun (Suwon-si, South Korea) and Kyoungwhan Oh (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided a plasma process apparatus including a chamber including a plasma processing space, a substrate stage included in the chamber, the substrate stage including a seating surface, a target including deposition particles to be deposited on the substrate, a gas supplier configured to supply gas into the chamber, a pla...