ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,505,943, issued on Dec. 23, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Multilayer inductor" was invented by Artem Rudolfovitch Vilenskiy (Moscow), Mikhail Nikolaevich Makurin (Moscow region, Russia) and Chongmin Lee (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A multilayer inductor is provided. The multilayer inductor includes a multilayer winding portion comprising a plurality of coil layers that are vertically stacked, and having an inner surface that defines a hollow of the plurality of coil layers and having an outer surface that defines an outer side and a magnetic compensator made of a soft magneti...