US Patent Issued to SAMSUNG ELECTRONICS on Dec. 2 for "Lensless imaging system including phase mask" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,489,990, issued on Dec. 2, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Lensless imaging system including phase mask" was invented by Duhyun Lee (Suwon-si, South Korea), Wontaek Seo (Suwon-si, South Korea) and Jangwoo You (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an imaging system including a phase mask including a phase modulation meta surface coded with an image reconstruction phase function configured to reconstruct an image, the image reconstruction phase function being obtained by adding a first phase function corresponding to a lens phase to a second phase function which is a random ...