US Patent Issued to SAMSUNG ELECTRONICS on Aug. 4 for "Wet recess for Ru subtractive process" (New York Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,701,986, issued on Aug. 4, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Wet recess for Ru subtractive process" was invented by Wonhyuk Hong (Clifton Park, N.Y.), Jaemyung Choi (Niskayuna, N.Y.), Jaejik Baek (Watervliet, N.Y.), Janggeun Lee (Delmar, N.Y.), Myunghoon Jung (Clifton Park, N.Y.), Taesun Kim (Ballston Spa, N.Y.) and Kang-ill Seo (Albany, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a dielectric layer, a plurality of vias formed in the dielectric layer, an adhesion layer deposited on a top surface of the dielectric layer, and a plurality of metal lines. A first metal line of the p...