US Patent Issued to SAMSUNG ELECTRONICS on April 7 for "Defect detection device and method thereof" (South Korean Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,597,122, issued on April 7, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Defect detection device and method thereof" was invented by Sungwook Hwang (Suwon-si, South Korea), Tae Soo Shin (Suwon-si, South Korea), Seulgi Ok (Suwon-si, South Korea) and Kibum Lee (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A defect detection device includes: a memory configured to store a layout image indicating a circuit pattern and indicating a dummy pattern; and a controller comprising an artificial neural network configured to learn the layout image, the controller being configured to: determine, based on an inspection ...