ALEXANDRIA, Va., April 15 -- United States Patent no. 12,599,874, issued on April 14, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea).
"Wastewater treatment system and method for semiconductor fabrication process" was invented by Jiwon Chun (Seongnam-si, South Korea), Jongkeun Yi (Osan-si, South Korea), Chongmin Chung (Jeonju-si, South Korea), Kangwoo Cho (Pohang-si, South Korea), Baekmin Seong (Suwon-si, South Korea), Minuk Joo (Pohang-si, South Korea) and Kyuwon Hwang (Incheon, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are wastewater treatment systems and methods for semiconductor fabrication process. The method comprises performing first concentration on was...