US Patent Issued to SAMSUNG ELECTRONICS on April 14 for "Substrate processing apparatus using supercritical fluid and driving method thereof" (South Korean Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,599,938, issued on April 14, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Substrate processing apparatus using supercritical fluid and driving method thereof" was invented by Sang Jine Park (Suwon-si, South Korea), Ji Hwan Park (Suwon-si, South Korea) and Kun Tack Lee (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a reactor having a processing space formed therein, a fluid supply unit supplying a supercritical fluid into the processing space of the reactor, and a controller controlling the reactor and the fluid supply unit. The controller controls, in response to...