ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,712,154, issued on Aug. 18, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION (Pohang-si, South Korea).

"Plasma apparatus" was invented by Jimo Lee (Suwon-si, South Korea), Hyung Gu Kang (Pohang-si, South Korea), GunSu Yun (Pohang-si, South Korea), Kyung-Sun Kim (Suwon-si, South Korea), Donghyeon Na (Suwon-si, South Korea), Seungbo Shim (Suwon-si, South Korea) and Seokyong Jeong (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma apparatus includes: a chamber; a first electrode and a second electrode disposed in the chamber; an RF power generator confi...