US Patent Issued to SAMSUNG ELECTRONICS, KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY on Sept. 29 for "Method of reducing nitrogen oxide concentration in sample, bioreactor, and plug flow reactor" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,747,458, issued on Sept. 29, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Gyeonggi-Do, South Korea) and KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (Daejeon, South Korea).

"Method of reducing nitrogen oxide concentration in sample, bioreactor, and plug flow reactor" was invented by Seung Hoon Song (Suwon-si, South Korea), Heejoo Han (Daejeon, South Korea), Woo Yong Shim (Suwon-si, South Korea), Sukhwan Yoon (Daejeon, South Korea), Jae-Young Kim (Suwon-si, South Korea), Sojung Yoon (Daejeon, South Korea) and Yu Kyung Jung (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of reducing a concentration of a nitrogen oxid...