US Patent Issued to SAMSUNG ELECTRONICS, INDUSTRY-ACADEMIC COOPERATION FOUNDATION, UNIVERSITY on July 14 for "Semiconductor process system and method of cleaning the same" (South Korean Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,161, issued on July 14, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and INDUSTRY-ACADEMIC COOPERATION FOUNDATION, UNIVERSITY (Yonsei, South Korea).

"Semiconductor process system and method of cleaning the same" was invented by Ireh Seo (Suwon-si, South Korea), Chang-Ha Lee (Seoul, South Korea), Taeung Yoon (Suwon-si, South Korea) and Rak-Young Jeon (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of cleaning a semiconductor processing system may include applying a vacuum pressure to a supply pipeline through which a process fluid is transferred to a process chamber and purging the supply pipeline w...