US Patent Issued to SAMSUNG ELECTRONICS, AUROS Technology on Feb. 17 for "Focus optimization for wafer which has multi-peak focus" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,553,712, issued on Feb. 17, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea) and AUROS Technology Inc (Hwaseong-si, South Korea).

"Focus optimization for wafer which has multi-peak focus" was invented by Jun Yeob Kim (Suwon-si, South Korea), Jin Ryeong Park (Hwaseong-si, South Korea) and Sol Lee Hwang (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An overlay measurement device includes: a light source configured to direct an illumination to an overlay measurement target in which a first overlay key formed in a first layer and a second overlay key formed in a second layer stacked on an upper portion of the fi...