ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,703,798, issued on Aug. 11, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Suwon-si, South Korea) and Adeka Corp. (Tokyo).

"Compositions for manufacturing thin film and methods for manufacturing semiconductor device using the same" was invented by Jae Woon Kim (Seoul, South Korea), Seung-Min Ryu (Hwaseong-si, South Korea), Haruyoshi Sato (Tokyo), Kazuya Saito (Tokyo), Masayuki Kimura (Tokyo), Takahiro Yoshii (Tokyo), Tsubasa Shiratori (Tokyo), Min Jae Sung (Seoul, South Korea), Gyu-Hee Park (Hwaseong-si, South Korea) and Youn Joung Cho (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Compositions for manufacturing a thin film are ...