US Patent Issued to SAMSUNG ELECTRO-MECHANICS on March 31 for "Dielectric grains of multilayered capacitor" (South Korean Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,592,341, issued on March 31, was assigned to SAMSUNG ELECTRO-MECHANICS Co. LTD. (Suwon-si, South Korea).

"Dielectric grains of multilayered capacitor" was invented by Yongju Yoo (Suwon-si, South Korea), Myungwoo Lee (Suwon-si, South Korea), Haesol Jung (Suwon-si, South Korea), Jinseong Kim (Suwon-si, South Korea), Jaemin Han (Suwon-si, South Korea) and Seungjun Hong (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a multilayered capacitor, including a capacitor body including a dielectric layer and an internal electrode, and an external electrode disposed outside the capacitor body, wherein the dielectric layer includes...