US Patent Issued to SAMSUNG ELECTRO-MECHANICS on April 14 for "Multilayered capacitor and manufacturing method of the same" (South Korean Inventors)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,227, issued on April 14, was assigned to SAMSUNG ELECTRO-MECHANICS Co. LTD. (Suwon-si, South Korea).

"Multilayered capacitor and manufacturing method of the same" was invented by Sehun Park (Suwon-si, South Korea), Youngghyu Ahn (Suwon-si, South Korea), Sung-Min Cho (Suwon-si, South Korea), Taejoon Park (Suwon-si, South Korea) and Hwidae Kim (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A multilayer capacitor includes: a body including a dielectric layer, and first and second internal electrodes stacked on each other in a thickness direction of the capacitor while being spaced apart from each other with the dielectric layer ...