ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,191, issued on March 24, was assigned to SAMSUNG DISPLAY Co. LTD. (Gyeonggi-Do, South Korea).
"Photolithography apparatus and method for forming photoresist pattern" was invented by Yong Hwan Ryu (Yongin-si, South Korea), Sang Jin Park (Yongin-si, South Korea), Sa Rah Lee (Cheonan-si, South Korea) and Sung Bae Ju (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A photolithography apparatus includes a cleaning unit which cleans a target substrate, a drying unit which dries the target substrate provided from the cleaning unit, and a coating unit which forms a photoresist layer by coating a photoresist on the target substrate p...