ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,557,579, issued on Feb. 17, was assigned to SAMSUNG DISPLAY Co. LTD. (Gyeonggi-Do, South Korea).

"Discharge method, discharge system and substrate processing apparatus including the same" was invented by Daesoo Kim (Seoul, South Korea) and Jimin Choi (Chungcheongnam-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A discharge method includes discharging discharge products including a first discharge gas and solid by-products from a process chamber, in which a substrate processing process is performed in a vacuum state, into an inside of a collection device, collecting the solid by-products in the collection device, introducing a portion of...