ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,698,554, issued on Aug. 4, was assigned to SAMSUNG DISPLAY Co. LTD. (Gyeonggi-Do, South Korea).
"Mask stage and mask manufacturing apparatus having the same" was invented by Kyongho Hong (Yongin-si, South Korea), Myungkyu Kim (Yongin-si, South Korea), Sungho Park (Yongin-si, South Korea), Chang-Kon Park (Yongin-si, South Korea), Sukbeom You (Yongin-si, South Korea) and Dongjae Lee (Yongin-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask stage includes a stage inclined with respect to a vertical direction perpendicular to a plane defined by a first direction and a second direction intersecting each other, a plurality of first support ...