ALEXANDRIA, Va., June 12 -- United States Patent no. 12,297,541, issued on May 13, was assigned to Robert Bosch GmbH (Stuttgart, Germany).
"Method for producing a nanoscale channel structure" was invented by Christoph Schelling (Stuttgart, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing a nanoscale channel structure disclosed. The method includes depositing and structuring a first sacrificial layer on a substrate, depositing a second sacrificial layer on the substrate and on the first sacrificial layer, depositing an etching masking layer on the second sacrificial layer, partly removing the etching masking layer and the second sacrificial layer, removing the first sacrificial la...