ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,779,833, issued on Nov. 3, was assigned to RM TOHCELLO Co. LTD. (Tokyo).
"Gas barrier laminate" was invented by Shingo Suzuki (Koga, Japan), Takaaki Iio (Koga, Japan), Tomoyoshi Hakamata (Koga, Japan) and Kenji Odagawa (Sodegaura, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A gas barrier laminate including: a base material layer; a gas barrier layer that is provided over at least one surface of the base material layer; and an inorganic material layer that is provided between the base material layer and the gas barrier layer, in which a composition ratio of Zn measured by X-ray photoelectron spectroscopy analysis of the gas barrier layer is 1 to ...