US Patent Issued to RIGAKU on Nov. 3 for "Correction device, system, method, and program" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,784,313, issued on Nov. 3, was assigned to RIGAKU Corp. (Tokyo).

"Correction device, system, method, and program" was invented by Takumi Ota (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A correction apparatus reduces calculation costs for correcting artifacts due to a beam hardening effect in reconstructing a CT image by correcting an artifact due to a beam hardening effect caused in reconstructing a CT image. The correction apparatus includes processing circuitry configured to acquire an incident X-ray distribution, acquire a linear absorption coefficient model representing an energy dependency of a linear absorption coefficient by a scale fact...