ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,508, issued on March 17, was assigned to Resonac Corp. (Tokyo).
"Composition, and method for cleaning adhesive polymer" was invented by Kotaro Hayashi (Tokyo) and Susumu Nakazaki (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a composition which is suppressed in decrease of the etching rate over time. A composition which contains; at least one of a quaternary alkyl ammonium fluoride and a hydrate of a quaternary alkyl ammonium fluoride; (A) an N-substituted amide compound that has no active hydrogen on a nitrogen atom and (B) a dipropylene glycol dimethyl ether, which serve as aprotic solvents; and an antioxida...