US Patent Issued to RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY on March 24 for "Low quality deepfake detection device and method of detecting low quality deepfake using the same" (South Korean Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,586,419, issued on March 24, was assigned to RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY (Suwon-si, South Korea).

"Low quality deepfake detection device and method of detecting low quality deepfake using the same" was invented by Simon Sungil Woo (Suwon-si, South Korea), Sang Yup Lee (Suwon-si, South Korea) and Jae Ju An (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A deepfake detection device may include a data input unit that receives an input image including a low-quality deepfake video, a branch-based super-resolution training unit that enhances the resolution of the input image through unsupervised super-resoluti...