ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,967, issued on July 21, was assigned to Realtek Semiconductor Corp. (Hsinchu, Taiwan).
"Inductor device" was invented by Hsiao-Tsung Yen (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An inductor device includes an inductor element, a substrate and a ground plane is disclosed. The ground plane includes several sub ground planes. The inductor element is set above the substrate, and the substrate is set above the ground plane. When at least one of several connection relationships between the several sub ground planes change, an inductance value of the inductor element changes."
The patent was filed on Dec. 15, 2021, under Application...