US Patent Issued to QUALCOMM on May 5 for "Techniques for determining beam metrics for maximum permissible exposure reporting" (Chinese, American Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,621,776, issued on May 5, was assigned to QUALCOMM Inc. (San Diego).

"Techniques for determining beam metrics for maximum permissible exposure reporting" was invented by Fang Yuan (Beijing), Yan Zhou (San Diego) and Tao Luo (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "Various aspects of the present disclosure generally relate to wireless communication. In some aspects, a user equipment (UE) may determine one or more beam metric values for one or more beams that are monitored by the UE, wherein the one or more beam metric values correspond to one or more of a beam power management maximum power reduction (P-MPR) metric, a beam uplink reference...