ALEXANDRIA, Va., April 7 -- United States Patent no. 12,597,978, issued on April 7, was assigned to QUALCOMM Inc. (San Diego).
"Beam selection for higher uplink performance in view of exposure limits" was invented by Jing Lin (Milpitas, Calif.), Tienyow Liu (Santa Clara, Calif.), Raghu Narayan Challa (San Diego), Jagadish Nadakuduti (Bermuda Dunes, Calif.) and Lin Lu (San Diego).
According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques and apparatus for beam selection in compliance with radio frequency (RF) exposure limits. A method that may be performed by a wireless device includes receiving, from another wireless device, a plurality of signals via a plurality of beams; measuring a received signal power for...