US Patent Issued to PSK on May 5 for "Apparatus for treating substrate and method for aligning dielectric plate using the same" (South Korean Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,560, issued on May 5, was assigned to PSK INC. (Hwaseong-si, South Korea).

"Apparatus for treating substrate and method for aligning dielectric plate using the same" was invented by Kwang-Sung Yoo (Hwaseong-si, South Korea) and Ju-Young Park (Hwaseong-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus for treating a substrate includes a housing including an open top and a treatment space therein, a gas supply unit configured to supply gas to the treatment space, a support unit including a chuck configured to support the substrate in the treatment space and an upper electrode provided to surround the check when viewed from the ...