ALEXANDRIA, Va., May 19 -- United States Patent no. 12,633,504, issued on May 19, was assigned to PSK INC. (Hwaseong-si, South Korea).
"Substrate processing apparatus" was invented by Kwang-Sung Yoo (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus is provided. The substrate processing apparatus includes a chuck supporting a substrate, a gas supply unit configured to supply a process gas to an edge region of the substrate supported on the chuck, and an edge electrode provided to surround the substrate supported on the chuck when viewed from above and to generate plasma from the gas, wherein the edge electrode has a ring shape and a groove recessed in a ...