ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,911, issued on Aug. 12, was assigned to PSK INC. (Gyeonggi-do, South Korea).
"Support unit, apparatus for treating substrate, and method for treating substrate" was invented by Ho Jae Sim (Gyeonggi-do, South Korea) and Hyeong Shin Cho (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a support unit included in an apparatus for treating a substrate by using plasma. The support unit may include: a chuck configured to support a lower surface of the substrate; a moving plate provided to surround the chuck when viewed from above; and a lifting member configured to change an exposed area of an edge reg...