ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,536,644, issued on Jan. 27, was assigned to Prosemi Co. Ltd. (Tainan, Taiwan).
"Detection pattern unit for detecting pattern on semiconductor device, and method and system for implementing the same" was invented by Tian-Xing Huang (Tainan, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A detection pattern unit includes an inner pattern group, and an outer pattern group that includes two sets of positioning detection patterns, each set including two lines of patterns. For each set, a pitch dimension between adjacent two patterns in one line of the set is the same as a pitch dimension between adjacent two patterns in the other lines of the set. The...