US Patent Issued to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION on Sept. 1 for "Coating method of long-chain entangled PDMS gel with sustainable self-replenishment of lubricating layer" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,723,172, issued on Sept. 1, was assigned to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION (Pohang-si, South Korea).

"Coating method of long-chain entangled PDMS gel with sustainable self-replenishment of lubricating layer" was invented by Sang Joon Lee (Pohang-si, South Korea) and Gyu Do Park (Pohang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure is related to a coating method of a long-chain entangled PDMS (LEP) gel in which self-replenishment of a lubricating layer is sustainable. More specifically, it is possible to achieve excellent slippery properties, anti-fouling performance, and anti-icing performanc...