US Patent Issued to POSTECH Research and Business Development Foundation on March 17 for "Method and device for learning fog-invariant feature" (South Korean Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,579,804, issued on March 17, was assigned to POSTECH Research and Business Development Foundation (Pohang-si, South Korea).

"Method and device for learning fog-invariant feature" was invented by Suha Kwak (Pohang-si, South Korea), Taeyoung Son (Pohang-si, South Korea) and Sohyun Lee (Pohang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A device for learning a fog-invariant feature includes a fog-pass filter, which is trained such that fog factors of the same fog domain approach each other and fog factors of different fog domains are apart from each other so as to determine a fog state of an input image as a fog factor, and a segmentati...