US Patent Issued to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION on Feb. 17 for "Sorbent for removing radon, production method for same, and radon removal method using same" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,551,862, issued on Feb. 17, was assigned to POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION (Pohang-si, South Korea).

"Sorbent for removing radon, production method for same, and radon removal method using same" was invented by Jae Eun Kang (Seongnam-si, South Korea), Woo Yong Um (Yongin-si, South Korea) and Kumar Singh Bhupendra (Pohang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a method of preparing an adsorbent for removing radon. The method includes (a) mixing a fluorine (F) compound and zeolite to produce a second mixture."

The patent was filed on Aug. 5, 2021, under Application No. 18/025,...